作者RalfSCU (風中的落葉)
看板translator
標題[譯者] 譯者RalfSCU 英、中翻譯
時間Sun Jul 5 21:32:19 2020
※ 注意事項：
1.本文格式僅供譯者自我介紹，不可介紹他人。
2. [必] 表示必填項目， [選] 表示選填項目。
──────── 發表文章時，請刪除本行以上（含本行）內容 ─────────
※ 標題格式：[譯者] ID_語系與服務內容_擅長領域
範例：[譯者] abcdefg_筆譯 英中互譯_法律醫學
（按 Ctrl-X 發文時、文章發表後，都可按大 T 修改標題。）
──────────────────────────────────────
[必]前次自介：（請填寫上次發表日期，若為初次發表得以免填）
[必]工作身分：（全職／筆譯）
[必]服務內容及費率：來信議價
[必]擅長領域：理工
[必]擅長類型：各式論文(包括期刊論文)
[必]試 譯：（接受試譯？500字內。）
[必]聯絡方式：站內信
[選]聯絡時間：（24小時皆可）
──────────────────────────────────────
[必]學 歷：（國立交通大學、應用化學系、博士）
[必]翻譯經歷：族繁不及備載
[選]工作經歷：（台灣光罩、鉅晶電子、華邦電子、光馳科技）
[選]翻譯證照：（若未提供請勿刪除）無
[選]語言證照：（TOEIC 2018）
[選]其他證照：（若未提供請勿刪除）
──────────────────────────────────────
[選]自我介紹：113 理學Ph. D.
原為單純的中科上班族
2016因為一台違規的貨車成了極重度殘障
接著遇到主管職場霸凌
被逼自願離職，失業至今
但是我還是得想辦法賺生活費和醫藥費
還請各位多幫忙，就算自己沒有需要，也幫我多介紹客戶，感恩。
[選]翻譯作品：（若未提供請勿刪除）
[選]個人網站：（若未提供請勿刪除）
[選]其他說明：
參考文件：
歷年著作(Publications)
一、 論文(Papers)
1. W. A. Loong, C. M. Lin, S. P. Tseng, W. L. Yeh,
“The correlation between the chemical compositions
and optical properties of TiSixNy as an embedded
layer for AttPSM in 193 nm”,
Microelectronic Engineering 57-58 (2001) pp. 481.
2. W. A Leong, H. Y. Lin, W. L. Yeh,
“Study on the optimization of high transmittance
attenuated phase-shifting mask by design of experiment”,
2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers.
3. K. T. Yeh, C. H. Lin, J. R. Hu and W. A. Loong,
“Modified Reflectance–Transmittance Method for the
Metrology of Thin Film Optical Properties”,
Jpn. J. Appl. Phys. 45 (2006) pp. 1566.
4. K. T. Yeh and W. A. Loong,
“Simulations of Mask Error Enhancement Factor in
193nm Immersion Lithography”,
Jpn. J. Appl. Phys. 45 (2006) pp. 2481.
5. K. T. Yeh, and W. A. Loong,
“Simulation for Optimization of Mask Error Enhancement Factor
by Design of Experiments in Both Dry and Immersion ArF Lithography”,
Jpn. J. Appl. Phys. 45 (2006) pp. 6216.
6. K. T. Yeh, H. Y. Lin and W. A. Loong,
“Simulation of Applications of High-Transmittance Embedded Layer
in Transmittance Control Mask and Optimization of
Attenuated Phase-Shifting Mask by Design of Experiment”,
Jpn. J. Appl. Phys. 46 (2007) pp. 105.
7. J. S. Chen, K. T. Yeh, C. C. Wu and D. Y. Kao,
“IR Study of Monomer–Dimer Selfassociation of
2,2-Dimethyl-3-ethyl-3-pentanol in n-Octane:
Determination of the Molar Absorptivities of
Monomer and Dimer Bands, and Dimerization Constants
Using Novel Equations”,
J. Solution chem.. 42 (2013) pp. 2269.
8. J. S. Chen, K. T. Yeh, W. Y. Chang and J. K. Baird,
“Estimation of the Moments of the Residence Time and First
Passage Time from Experimentally Measurable Permeation Parameters
via a New Formulation of the Transmission Matrix”,
J. Chin. chem. Soc. 61 (2014) pp. 867.
9. K. T. Yeh and C. Y. Huang,
“Two new design methods for lithography mask:
phase-shifting scattering bar and interlaced phase-shifting mask”,
Proc. SPIE 9256 (2014) pp. 95260W-1
10. J. S. Chen, K. T. Yeh and W. Y. Chang,
“Green’s Function and Eigenvalue Representation of Time Lag
for Absorptive Permeation Across a Heterogeneous Membrane”,
J. Chin. chem. Soc. 64 (2017) pp. 1048.
11. J. S. Chen, K. T. Yeh, D. Y. Kao and J. K. Baird,
“Toward a Better Determination of Infrared Molar Absorptivities
and Dimer Formation Constants in Self-association
Through Hydrogen Bonding:
3-Ethyl-2-methyl-3-pentanol in Tetrachloroethylene as an Example”,
J. Chin. chem. Soc. 64 (2017) pp. 1156.
12. J. S. Chen, K. T. Yeh and W. Y. Chang,
“Insights into the Kramers’ flux-over-population rate
for chemical reactions in liquid phases through
the matrix transport equation”,
J. Chin. chem. Soc. 66 (2019) pp. 899.
二、 專利(Patents)
1. K. T. Yeh, “Optical proximity correction photomask”, US Patent 8524424 (2013)
──────────────────────────────────────
--
※ 發信站: 批踢踢實業坊(ptt.cc), 來自: 118.166.213.7 (臺灣)
※ 文章網址: https://webptt.com/m.aspx?n=bbs/translator/M.1593955941.A.F5B.html
1F：推 dskdlkj: 幫你加油 07/06 00:13
2F：推 kimberleyt: 推推 07/09 04:46