作者wodada (wodada)
看板NEMS
標題[問題] 關於微機電概論的修課問題.....
時間Fri Dec 11 20:43:18 2009
小弟有幸在這學期修了微機電概論這門課
在作業方面有不少問題,因為缺乏實務做的經驗
所以在基礎方面並不是很好
望請各位海涵!!!
Q1: Calculate the resolution for the following projection systems
(and depth of focus for projection systems)
(1) Contact Lithography with 入=0.436um(g-line)and resist
thickness=1 micron.
(2) Proximity Lithography with 入=0.436um(h-line)and resist
thickness=1 micron and a mask-wafer separation=5um
(3) Projection Lithography with 入=0.365um (g-line)and NA=0.4
Q2: What are the relative advantage AND disadvatage of contact and projection
photolithography?
O3: Assume you spin Resist A on a 10-cm wafer at 1000-RPM and get 1 um.
(1) What speed would you need to spin a 10-cm wafer to get 342nm of Resist
A?
(2) What speed would you need to spin a 10-cm wafer to get 4.6um of Resist
A?
PS:1um = 10^-6 m
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1F：→ wodada:其中的micro就是單位um 12/11 20:45
2F：→ leox243:所以你是來問作業答案的? 12/11 22:39
3F：→ oklag:入=0.436um XD 12/11 22:46
4F：推 pitoc:把題目貼出來的意思是什麼? 要大家幫你寫作業嗎? 12/11 23:03
5F：推 quaintness:micron ...才是單位 micro 是數量級吧 ○rz 12/11 23:03
6F：噓 MyWay15:這也太誇張了吧...你真的有認真想要學好這門課嗎 12/11 23:44
7F：→ wodada:我翻遍所有的書,都還找不到答案...... 12/11 23:45
8F：→ threedices:想問題目問甚麼看得懂嗎? 課本? 12/12 04:46
9F：→ tzjwinfcha:這不是基本的嗎?? 12/12 10:28
10F：→ pitoc:可以先請教助教 或者翻翻老師上課講義 12/12 10:41
11F：→ wodada:感謝各位的指教,我現在只差最後一大題不會,其他都OK了 12/12 14:43
12F：推 Jinuse:第一題跟第三題都有公式可以代進去唷 12/12 23:14
13F：推 oactioner:希望你之後能po解答來活絡這版 而不要一直只有問問題 12/13 00:39