作者wodada (wodada)
看板NEMS
标题[问题] 关於微机电概论的修课问题.....
时间Fri Dec 11 20:43:18 2009
小弟有幸在这学期修了微机电概论这门课
在作业方面有不少问题,因为缺乏实务做的经验
所以在基础方面并不是很好
望请各位海涵!!!
Q1: Calculate the resolution for the following projection systems
(and depth of focus for projection systems)
(1) Contact Lithography with 入=0.436um(g-line)and resist
thickness=1 micron.
(2) Proximity Lithography with 入=0.436um(h-line)and resist
thickness=1 micron and a mask-wafer separation=5um
(3) Projection Lithography with 入=0.365um (g-line)and NA=0.4
Q2: What are the relative advantage AND disadvatage of contact and projection
photolithography?
O3: Assume you spin Resist A on a 10-cm wafer at 1000-RPM and get 1 um.
(1) What speed would you need to spin a 10-cm wafer to get 342nm of Resist
A?
(2) What speed would you need to spin a 10-cm wafer to get 4.6um of Resist
A?
PS:1um = 10^-6 m
--
※ 发信站: 批踢踢实业坊(ptt.cc)
◆ From: 114.47.166.224
1F：→ wodada:其中的micro就是单位um 12/11 20:45
2F：→ leox243:所以你是来问作业答案的? 12/11 22:39
3F：→ oklag:入=0.436um XD 12/11 22:46
4F：推 pitoc:把题目贴出来的意思是什麽? 要大家帮你写作业吗? 12/11 23:03
5F：推 quaintness:micron ...才是单位 micro 是数量级吧 ○rz 12/11 23:03
6F：嘘 MyWay15:这也太夸张了吧...你真的有认真想要学好这门课吗 12/11 23:44
7F：→ wodada:我翻遍所有的书,都还找不到答案...... 12/11 23:45
8F：→ threedices:想问题目问甚麽看得懂吗? 课本? 12/12 04:46
9F：→ tzjwinfcha:这不是基本的吗?? 12/12 10:28
10F：→ pitoc:可以先请教助教 或者翻翻老师上课讲义 12/12 10:41
11F：→ wodada:感谢各位的指教,我现在只差最後一大题不会,其他都OK了 12/12 14:43
12F：推 Jinuse:第一题跟第三题都有公式可以代进去唷 12/12 23:14
13F：推 oactioner:希望你之後能po解答来活络这版 而不要一直只有问问题 12/13 00:39