作者mermaid270 (littlemermaid)
看板NEMS
標題[問題]請板上的強者大大幫個忙~~~
時間Sun Jun 7 14:03:05 2009
Suppose that you are a dry etching process
engineer in charge of poly-Si etching process(gate electrode). You have
found that the critical dimension loss in one particular day is 10 % higher
than the specification. Please find 2 reasons that con possible lead to this
change, and point out how to prove your idea(check what quantities, by
what tool(s)…).
有板上的大大可以幫我想這個問題嗎?
感激不盡!!!!!!
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