作者mermaid270 (littlemermaid)
看板NEMS
标题[问题]请板上的强者大大帮个忙~~~
时间Sun Jun 7 14:03:05 2009
Suppose that you are a dry etching process
engineer in charge of poly-Si etching process(gate electrode). You have
found that the critical dimension loss in one particular day is 10 % higher
than the specification. Please find 2 reasons that con possible lead to this
change, and point out how to prove your idea(check what quantities, by
what tool(s)…).
有板上的大大可以帮我想这个问题吗?
感激不尽!!!!!!
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