http://www.eeel.nist.gov/812/conference/ Frontiers of Characterization and Metrology for Nanoelectronics (week of) May 11-15, 2009 College of Nanoscale Science and Engineering, University at Albany, Albany, NY Abstract Deadline is December 17th! Confirmed Speakers Sitaram Arkalgud, SEMATECH Dirk Beernaert, European Nanoelectronics Initiative Advisory Council Pierre Bleuet, ESRF Amal Chabli, CEA-DRT-LETI Alain Diebold, University of Albany Bruce Doris, IBM Thomas Ernst, CEA-LETI Hongjun Gao, Institute of Physics, Chinese Academy of Sciences Holm Geisler, AMD Saxony Manufacturing GmbH Greg Hughes, SEMATECH Martin Hytch, CEMES-CNRS Alain Kaloyeros, College of Nanoscale Science and Engineering, Univ. at Albany Christian Kisielowski, National Center for Electron Microscopy, Lawrence Berkeley National Laboratory Koji Kuroda, Dai Nippon Printing Ji Ung Lee, College of Nanoscale Science and Engineering, Univ. at Albany Mark Lundstrom, Purdue University Jens Martin, Weizman Institute Meyya Meyyapan, Center for Nanotechnology, NASA, Ames Research Center Chris Ober, Department of Material Science and Engineering, Cornell Hideo Ohno, Tohoku University Wolfgang Osten, Institute of Technical Optics (ITO) Stuttgart Michael Postek, NIST Derk Rading, ION-TOF-GmbH Bart Rijpers, ASML Michael Steigerwald, Carl Zeiss Hans Stork, Applied Materials, Inc. Brad Thiel, University at Albany - SUNY Wilfried Vandervorst, IMEC Bertrand Vilquin and Brice Gautier, Nanotechnology Institute of Lyon Francois Vurpillot, Institut des Materiaux, UFR Sciences et Techniques Jeff Welser, Semiconductor Research Corporation Konrad Winkler, Omicron NanoTechnology GmbH Wenbing Yun, Xradia Inc. The 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (formerly titled Characterization and Metrology for ULSI Technology) will be held the week of May 11-15, 2009, at the College of Nanoscale Science and Engineering, University at Albany, Albany, New York. This conference, the seventh in the series, focuses on the frontiers and innovation in characterization and metrology of nanoelectronics. For details on the proceedings of our previous conferences, please visit the American Institute of Physics (AIP). Committee Co-Chairs David Seiler, NIST Alain Diebold, University at Albany Bob McDonald, Technology Associates (Treasurer) Mike Garner, Intel Dan Herr, SRC Rajinder Khosla, NSF Committee Members Caroline Ayre, Numonyx Harold Bloess, Qimonda Alexander Braun, Semiconductor International Amal Chabli, LETI Michael Current, Frontier Semiconductor Dick Hockett, Evans Analytical Group LLC Toshihiko Kanayama, AIST David Kyser, Applied Materials Shifeng Lu, Micron Ulrich Mantz, Zeiss Lori S. Nye, Brewer Science, Inc. Yaw Obeng, NIST Sandip Tiwari, Cornell University Victor Vartanian, ISMI Wilfried Vandervorst, IMEC Bettina Weiss, SEMI Ehrenfried Zschech, AMD --

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