国立清华大学与利物浦大学双联博士学位奖学金 国立清华大学材料系阙郁伦教授与利物浦大学化学系Colin R. Crick教授 招收双联学位博士生一名 欢迎有志於奈米材料、电化学反应、感测及绿能应用的同学申请。 此奖学金补助博士班四年修业期间之学杂费，详情请参考以下说明， 有兴趣的同学请联系清华大学材料系阙郁伦教授联系 连络信箱： [email protected] NTHU-UoL Dual PhD Programme Proposal UoL Supervisor: Dr. Colin R. Crick, Department of Chemistry Email: [email protected] Telephone: +44-(0)151-794-3534 NTHU Supervisor: Prof. Yu-Lun Chueh, Department of Materials Science and Engineering Email: [email protected] Telephone: +886-3-572-2366 Project Title: Extended Applications of Hierarchical Semiconductor Materials via Chemical Vapour Deposition Aim The project aims to develop strategically structured semiconductor substrates for a range of applications, including; gas sensing, electrochemistry, and catalysis. The materials will target real-world utilisation, principally through providing resistance to both; wetting and chemical degradation. The project ultimate targets the design of a self-cleaning (superhydrophobic) gas sensors, able to function in challenging environmental conditions. Background/Methodology: Semiconductors are commonly applied to chemical detection, and the facilitation of reactions, due to their electronic structure. The electronic properties of these materials are utilised in two main ways; (i) the presence of molecules at the surface of semiconductors can electronically perturbate these materials which is then detected (e.g. gas detection), (ii) the electronic levels can also be manipulated to drive chemical reactions (e.g. electrochemistry). In addition, the unique I-V behaviours such as resistive switching or novel device configurations based these materials will be investigated. These materials (particularly gas sensors) require the target molecule to make direct contact (physisorption/chemisorption) with the semiconductor substrate. Consequently, they are susceptible to surface contamination, as access to the surface of the material may be blocked. Resulting in a reduction in device sensitivity as the amount of contamination increases. This is a key concern for the long-term use of these materials, whereby a progressive sensitivity loss is continually considered, or special measures (including; regular device cleaning, or protective housing) must be taken. A semiconductor material able to remain functional over long periods, without these specific concerns, will provide a leap in versatility/applicability. The project targets the use of superhydrophobic materials in combination with semiconductors to prevent surface contamination. Superhydrophobic materials demonstrate self-cleaning properties, whereby water droplets (e.g. rain) remove surface contaminants by a mechanism termed; ‘the Lotus effect’. This would enable continual gas sensing functionality (or device functionality) with periodic exposure to water flow across the surface. While also preventing wetting of the surface, which would also interfere with molecular sensing. Superhydrophobic materials require two surface properties; (i) a high surface roughness (micro/ nanoscale), and (ii) and inherently water repellent surface chemistry. The proposed architecture will utilise highly rough semiconductor materials, with a hydrophobic modification to the surface chemistry – resulting in superhydrophobic properties. The target material demonstrates partial functionalisation of the semiconductor material, limited to the top surface. This provides elevated water repelling properties, while maintaining a portion of uncoated semiconductor surface for continued functionality (e.g. gas sensing). Objectives (Program of Study) The project objectives are strategically organised to provide the highest potential for success. The key objectives and organisation of the research project is presented below: NTHU (Months 0-24): The Chemical Vapour Deposition (CVD), and materials characterisation of semiconductors. High surface roughness semiconductors. Functional materials testing (e.g. gas sensing). During this period, the mandatory NTHU postgraduate courses (detailed at the end of this document) will be undertaken by the student. UoL (Months 24-48): Superhydrophobic materials via CVD. Surface functionalisation of high surface roughness semiconductors. Generation of superhydrophobic semiconductors. Optimisation of functional properties. Real-world materials testing – in collaboration with NTHU collaborators. Collaborator Suitability The partnership demonstrates key areas of complementary skills and capability. The NTHU supervisor (Prof. Yu-Lun Chueh) has extensive experience in the fabrication, characterisation, and functional testing of semiconductor materials. Prof. Chueh’s laboratory includes advanced materials testing (including; gas sensing flow detectors), and characterisation facilities (including; high- resolution transmission electron microscopy) which are essential to the proposed research. The UoL supervisor (Dr. Colin R. Crick) specialist area also focuses on materials fabrication, characterisation, and testing. However, this is dedicated to the manipulation of surface microstructure, and surface chemistry – including superhydrophobic materials. Dr. Crick is based in the Materials Innovation Factory (UoL), which includes access to surface chemistry testing facilities essential to the project (including; confocal Raman spectroscopy, and wettability measurement). Both UoL and NTHU supervisors utilise the deposition of functional thin films in their research, and as a result share many associated interests – this includes the use of CVD for materials fabrication. The project requires the development of novel CVD semiconductor deposition processes. This initial development will take place in the first part of the PhD (in NTHU), however can be directly transferred to UoL facilities in the latter part of the project. A collaborative utilisation of research facilities is envisioned for the entire project. Courses/Modules (NTHU): Students need to finish core courses during the staying in NTHU. --

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