作者cxzdsa (cxzdsa)
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标题[试题] 100上 吕宗昕 材料科学概论 期末考
时间Tue Jan 10 17:27:52 2012
课程名称︰材料科学概论
课程性质︰系选修
课程教师︰吕宗昕
开课学院:工学院
开课系所︰化工系
考试日期(年月日)︰100/1/10
考试时限(分钟):120
是否需发放奖励金:是
(如未明确表示,则不予发放)
试题 :
1.
(a) Please describe the behavior of creep.(4 Points)
(b) Please describe the major three steps of fatigue failure.(6 points)
(c) Please draw figures to show the fracture behavior for highly ductile
materials, moderately ductile materials, and brittle materials.(6 points)
2.
A copper alloy gas a plane strain fracture toughness if 52 MPa, It is found
fracture results at a stress of 430MPa when the maximum interal crack length
us 3.2mm. Compute the stress in the same alloy when fracture will occur for a
critical interal crack length of 4.5mm.(15 points)
3.
Steady state creep rate data are listed as below for aluminum @ 1200 degree C
creep rate: 10E-4 (1/s) at stress = 12MPa
creep rate: 10E-6 (1/s) at stress = 4MPa
Compute the steady state creep rate @ 800 degree C when stress =11MPa. The
activation energy for creep is 320 kJ/mol. (15 points)
4.
(a) What is the crystal structure name and indicate the position of each ion
for BaTiO3. (6 points)
(b) Please calculate the ideal density of BaTiO3. Atomic weights of Ba, Ti, O
are 137.34, 47.90, and 15.9994, respectively. The lattice constant of
BaTiO3 is 0.42 nm. (6 points)
5.
A parallel plate capacitor has an area of 8 E-3 m^2 and a plate separation of
4 E-4 m. The applied voltage is 30V. The polarization of the inserted
material is 3 E-6 C/m^2. Calculate the dielectric constand of the material,
the capacitance of the capacitorm the stored charge on each plate, abd the
dielectric displacement. 8.85 E-12 is given. (20 points)
6.
(a) Please draw the band structures for conductors such as Cu and extrinsic
p-type semiconductors. (8 points)
(b) Please draw a phase diagram for Al2O3-Cr2O3. These two materials form
complete solid solutions. m.p. of Al2O3 = 2045 and of Cr2O3 = 2275
degree C. (4 points)
7.
Calculate the conductivity of the doped silicon @ 30 degree C when
3 E16 1/m^3 phosphorus is doped in silicon. The electrical condoctivity for
pure silicon @ 30 degree C is 7.6 E-4 1/(ohm-m), amd the electrom and hole
mobility are 0.18 and 0.064 m^2/v-s, and e= 1.6 E-19. (10%)
ends
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