作者askakai (没记忆就只是空壳)
看板Electronics
标题[问题] 请问一些半导体制程的问题
时间Sun Jun 18 13:52:44 2006
不好意思
我有一些半导体制程的问题想请教大家:
(1)Why the potential of a glow discharge used in dry etching or sputtering
deposition is positive, relative to ground
(2)When etching Si over SiO2 in a CF4 plasma, the problem of obtaining an
adequately high Sfs does not usually exist. Why?
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